Issue 19, 2008

Thin and continuous films with controlled bi- and tri-modal porosities by embedment of zeolitenanoparticles in a mesoporous matrix

Abstract

Continuous, well-adhered silicon dioxide thin films (∼100 nm) with multi-mode porosity (micro/meso/macro) have been fabricated through a series of inorganic–organic self-assembly techniques, in essence, combining zeolite nanoparticles and a 2D hexagonal structured mesoporous system in a facile but effective approach. Silicalite-1 nanoparticles (average particle size ∼60 nm) were added to a mixture of block co-polymer (Pluronic 123 and Brij 56) and tetraethoxyorthosilane (TEOS) and the resulting solution deposited as a thin film viaspin coating techniques. Under low loadings of zeolite nanoparticles, the calcined films retain their conventional 2D hexagonal array of pores but at high concentrations of nanoparticles, part of the mesoporous structure is converted to a macroporous structure as a result of accumulating intrinsic stress within the thin film. Nanoparticle loaded thin films with concentrations close to 70% were possible as the mesoporous structure functions as an adhesion promoter for the zeolite nanoparticles and, crucially, it does not interfere with the accessibility of the zeolite nanoparticles. Furthermore, we explore the pore diffusion and templating properties of these novel films by infilling with germanium nanocrystalsvia supercritical fluid inclusion methods within the channels of the mesoporous segments of the films.

Graphical abstract: Thin and continuous films with controlled bi- and tri-modal porosities by embedment of zeolite nanoparticles in a mesoporous matrix

Supplementary files

Article information

Article type
Paper
Submitted
17 Jan 2008
Accepted
28 Feb 2008
First published
19 Mar 2008

J. Mater. Chem., 2008,18, 2213-2220

Thin and continuous films with controlled bi- and tri-modal porosities by embedment of zeolite nanoparticles in a mesoporous matrix

R. A. Farrell, N. Petkov, H. Amenitsch, J. D. Holmes and M. A. Morris, J. Mater. Chem., 2008, 18, 2213 DOI: 10.1039/B800924D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements