Issue 4, 2001
From the journal:

Journal of Materials Chemistry

Shigehito Deki,*a   Sachihiko Iizuka,a   Kensuke Akamatsu,a   Minoru Mizuhataa  and  Akihiko Kajinamia  

* Corresponding authors

a Department of Chemical Science and Engineering, Faculty of Engineering, Kobe University, Rokkodai, Nada, Kobe, Japan
E-mail: deki@kobe-u.ac.jp

Abstract

A novel technique for the direct synthesis of Si1 − xTixO2 thin films with graded composition profiles has been studied in aqueous solution, in which the (NH4)2SiF6 solutions were added into the (NH4)2TiF6 master solution under time- and rate-controlled reaction conditions: the composition of the films in the direction of the film thickness was successfully controlled over a wide range by this technique.

Graphical abstract: Novel fabrication method for SiTiO thin films with graded composition profiles by liquid phase deposition

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Article information

DOI
https://doi.org/10.1039/B100615K
Article type
Communication
Submitted
17 Jan 2001
Accepted
09 Feb 2001
First published
23 Feb 2001

J. Mater. Chem., 2001,11, 984-986

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Novel fabrication method for Si1 − xTixO2 thin films with graded composition profiles by liquid phase deposition

S. Deki, S. Iizuka, K. Akamatsu, M. Mizuhata and A. Kajinami, J. Mater. Chem., 2001, 11, 984 DOI: 10.1039/B100615K

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