Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 4, 2013
Previous Article Next Article

Buffer-gas assisted high irradiance femtosecond laser ionization orthogonal time-of-flight mass spectrometry for rapid depth profiling

Author affiliations

Abstract

High irradiance femtosecond laser ionization orthogonal time-of-flight mass spectrometry (fs-LI-O-TOFMS) has been applied for the depth profile analysis of multilayer samples. Elements in each layer can be determined with respect to the depth of solid sample surfaces. A nanosecond laser was also applied in parallel for comparison. The analytical performances as well as crater formation mechanisms of femtosecond and nanosecond laser ablation and ionization were compared. Superiorities of the depth resolution and trace elemental detection were observed in the femtosecond laser mode. fs-LI-O-TOFMS is capable of presenting the complete and explicit spectrum for each laser shot, performing depth profiling of coated layers with various thicknesses (tens of nanometers to tens of micrometers), providing multi-elemental information, and examining samples with conductive and nonconductive substrates.

Graphical abstract: Buffer-gas assisted high irradiance femtosecond laser ionization orthogonal time-of-flight mass spectrometry for rapid depth profiling

Back to tab navigation

Article information


Submitted
12 Oct 2012
Accepted
20 Dec 2012
First published
21 Dec 2012

J. Anal. At. Spectrom., 2013,28, 499-504
Article type
Technical Note

Buffer-gas assisted high irradiance femtosecond laser ionization orthogonal time-of-flight mass spectrometry for rapid depth profiling

M. He, B. Li, S. Yu, B. Zhang, Z. Liu, W. Hang and B. Huang, J. Anal. At. Spectrom., 2013, 28, 499
DOI: 10.1039/C2JA30288H

Social activity

Search articles by author

Spotlight

Advertisements