Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Volume 191, 2016
Previous Article Next Article

Self-folding nanostructures with imprint patterned surfaces (SNIPS)

Author affiliations

Abstract

A significant need in nanotechnology is the development of methods to mass-produce three-dimensional (3D) nanostructures and their ordered assemblies with patterns of functional materials such as metals, ceramics, device grade semiconductors, and polymers. While top-down lithography approaches can enable heterogeneous integration, tunability, and significant material versatility, these methods enable inherently two-dimensional (2D) patterning. Bottom-up approaches enable mass-production of 3D nanostructures and their assemblies but with limited precision, and tunability in surface patterning. Here, we demonstrate a methodology to create Self-folding Nanostructures with Imprint Patterned Surfaces (SNIPS). By a variety of examples, we illustrate that SNIPS, either individually or in ordered arrays, are mass-producible and have significant tunability, material heterogeneity, and patterning precision.

Back to tab navigation

Associated articles

Supplementary files

Article information


Submitted
22 Feb 2016
Accepted
24 Feb 2016
First published
02 Mar 2016

Faraday Discuss., 2016,191, 61-71
Article type
Paper

Self-folding nanostructures with imprint patterned surfaces (SNIPS)

H. R. Kwag, J. Cho, S. Park, J. Park and D. H. Gracias, Faraday Discuss., 2016, 191, 61
DOI: 10.1039/C6FD00021E

Social activity

Search articles by author

Spotlight

Advertisements