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Issue 31, 2018
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Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

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Abstract

In this paper we report on a novel chemical vapour deposition approach to the formation and control of composition of mixed anion materials, as applied to titanium oxynitride thin films. The method used is the aerosol assisted chemical vapour deposition (AACVD) of a mixture of single source precursors. To explore the titanium–oxygen–nitrogen system the single source precursors selected were tetrakis(dimethylamido) titanium and titanium tetraisopropoxide which individually are precursors to thin films of titanium nitride and titanium dioxide respectively. However, by combining these precursors in specific ratios in a series of AACVD reactions at 400 °C, we are able to deposit thin films of titanium oxynitride with three different structure types and a wide range of compositions. Using this precursor system we can observe films of nitrogen doped anatase, with 25% anion doping of nitrogen; a new composition of pseudobrookite titanium oxynitride with a composition of Ti3O3.5N1.5, identified as being a UV photocatalyst; and rock-salt titanium oxynitride in the range TiO0.41N0.59 to TiO0.05N0.95. The films were characterised using GIXRD, WDX and UV-vis spectroscopy, and in the case of the pseudobrookite films, assessed for photocatalytic activity. This work shows that a so-called dual single-source CVD approach is an effective method for the deposition of ternary mixed anion ceramic films through simple control of the ratio of the precursors, while keeping all other experimental parameters constant.

Graphical abstract: Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

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Article information


Submitted
12 Dec 2017
Accepted
05 Feb 2018
First published
05 Feb 2018

Dalton Trans., 2018,47, 10536-10543
Article type
Paper

Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

K. Rees, E. Lorusso, S. D. Cosham, A. N. Kulak and G. Hyett, Dalton Trans., 2018, 47, 10536
DOI: 10.1039/C7DT04694D

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