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Issue 16, 2016
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In situ electrodeposition of a Cu2O/SnO2 periodical heterostructure film for photosensor applications

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Abstract

Heterostructure materials with a strictly periodic arrangement in hundreds of microns based on tunneling modulation are ideal candidates for micro-nanodevice applications. In this paper, we propose a Cu2O/SnO2 periodical heterostructure film, which is prepared by electrochemical deposition in a quasi-2D ultra-thin liquid layer. The surface morphology and the component of the film were analyzed by scanning electron microscopy (SEM), scanning probe microscopy (SPM) and transmission electron microscopy (TEM). The influences of frequency and amplitude of periodic deposition potential on the morphology and regular distribution of the interface were studied. The photoresponsivity of this material was researched, and the response behaviors for different illumination conditions were recorded carefully. Based on the tunneling modulation mechanism, it exhibits reasonable photoresponsivity to UV light.

Graphical abstract: In situ electrodeposition of a Cu2O/SnO2 periodical heterostructure film for photosensor applications

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Supplementary files

Article information


Submitted
03 Feb 2016
Accepted
16 Mar 2016
First published
16 Mar 2016

Phys. Chem. Chem. Phys., 2016,18, 10918-10923
Article type
Paper

In situ electrodeposition of a Cu2O/SnO2 periodical heterostructure film for photosensor applications

G. Cui, C. Xiao, P. Zhang and M. Zhang, Phys. Chem. Chem. Phys., 2016, 18, 10918
DOI: 10.1039/C6CP00772D

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