Issue 13, 2012

Metal speciation in a complexing soft film layer: a theoretical dielectric relaxation study of coupled chemodynamic and electrodynamic interfacial processes

Abstract

We report a comprehensive formalism for the dynamics of metal speciation across an interphase formed between a complexing soft film layer and an electrolyte solution containing indifferent ions and metal ions that form complexes with charged molecular ligands distributed throughout the film. The analysis integrates the intricate interplay between metal complexation kinetics and diffusive metal transfer from/toward the ligand film, together with the kinetics of metal electrostatic partitioning across the film/solution interphase. This partitioning is determined by the settling dynamics of the interfacial electric double layer (EDL), as governed by time-dependent conduction–diffusion transports of both indifferent and reactive metal ions. The coupling between such chemodynamic and electrodynamic processes is evaluated via derivation of the dielectric permittivity increment for the ligand film/electrolyte interphase that is perturbed upon application of an ac electric field (pulsation ω) between electrodes supporting the films. The dielectric response is obtained from the ω-dependent distributions of all ions across the ligand film, as ruled by coupled Poisson–Nernst–Planck equations amended for a chemical source term involving the intra-film complex formation and dissociation pulsations (ωa and ωd respectively). Dielectric spectra are discussed for bare and film coated-electrodes over a wide range of field pulsations and Deborah numbers De = ωa,d/ωdiff, where ωdiff is the electric double layer relaxation pulsation. The frequency-dependent dynamic or inert character of the formed metal complexes is then addressed over a time window that ranges from transient to fully relaxed EDL. The shape and magnitude of the dielectric spectra are further shown to reflect the lability of dynamic complexes, i.e. whether the overall speciation process at a given pulsation ω is primarily rate-limited either by complexation kinetics or by ion-transport dynamics. The limits, strengths and extensions of the approach are further discussed within the context of metal speciation dynamics at soft planar and particulate complexing interphases.

Graphical abstract: Metal speciation in a complexing soft film layer: a theoretical dielectric relaxation study of coupled chemodynamic and electrodynamic interfacial processes

Supplementary files

Article information

Article type
Paper
Submitted
16 Nov 2011
Accepted
06 Feb 2012
First published
08 Feb 2012

Phys. Chem. Chem. Phys., 2012,14, 4491-4504

Metal speciation in a complexing soft film layer: a theoretical dielectric relaxation study of coupled chemodynamic and electrodynamic interfacial processes

J. Merlin and J. F. L. Duval, Phys. Chem. Chem. Phys., 2012, 14, 4491 DOI: 10.1039/C2CP23611G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements