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Issue 24, 2011
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Hydrogen bonding configuration and thermal stability of ambient exposed and in situ hydrogenated polycrystalline diamond surfaces studied by high resolution electron energy loss spectroscopy

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Abstract

In this work we report on an investigation of hydrogen bonding and thermal stability on the surface of poly-crystalline diamond by high resolution electron energy loss spectroscopy (HR-EELS). Diamond films were grown on silicon substrates from CH4/H2 as well as from CD4/D2 gas mixtures by hot filament chemical vapor deposition (HF-CVD). The impact of ex situ ambient exposure on hydrogen bonding and its thermal stability was examined for: (i) as deposited films from a CH4/H2 gas mixture; (ii) the same sample treated ex situ in micro-wave activated hydrogen plasma; and (iii) as deposited films from a CD4/D2 gas mixture. In order to clarify the changes in the hydrogen bonding configuration detected on the different surfaces as a function of thermal annealingin situhydrogenation by thermally activated atomic hydrogen was performed and examined. This study provides direct evidence that the exposure to ambient conditions and low temperature vacuum annealing have a pronounced effect on the hydrogen–carbon bonding configuration onto the poly-crystalline diamond surfaces.

Graphical abstract: Hydrogen bonding configuration and thermal stability of ambient exposed and in situ hydrogenated polycrystalline diamond surfaces studied by high resolution electron energy loss spectroscopy

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Article information


Submitted
04 Jan 2011
Accepted
22 Mar 2011
First published
18 Apr 2011

Phys. Chem. Chem. Phys., 2011,13, 11471-11480
Article type
Paper

Hydrogen bonding configuration and thermal stability of ambient exposed and in situ hydrogenated polycrystalline diamond surfaces studied by high resolution electron energy loss spectroscopy

Sh. Michaelson, R. Akhvlediani and A. Hoffman, Phys. Chem. Chem. Phys., 2011, 13, 11471
DOI: 10.1039/C1CP00019E

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