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Issue 11, 2011
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Solvent response of polymers for micromachine manipulation

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Abstract

A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.

Graphical abstract: Solvent response of polymers for micromachine manipulation

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Publication details

The article was received on 02 Oct 2010, accepted on 18 Jan 2011 and first published on 11 Feb 2011


Article type: Communication
DOI: 10.1039/C0CP02006K
Citation: Phys. Chem. Chem. Phys., 2011,13, 4835-4838

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    Solvent response of polymers for micromachine manipulation

    Y. Tian, Y. Zhang, H. Xia, L. Guo, J. Ku, Y. He, R. Zhang, B. Xu, Q. Chen and H. Sun, Phys. Chem. Chem. Phys., 2011, 13, 4835
    DOI: 10.1039/C0CP02006K

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