Issue 23, 2015

Effects of atomic scale imperfection at the interfaces of CoSi2 and Si (100) on Schottky barrier contacts

Abstract

We report here the correlation of electrical properties on Schottky barrier contacts and atomic scale imperfections based on the degree of lattice distortion and moiré fringes at the interfaces of CoSi2 and Si. The I-V measurements showed that the higher levels of perfection of the interfaces gave better Schottky barrier characteristics and we discuss the implications of the transport property at Schottky barrier contacts.

Graphical abstract: Effects of atomic scale imperfection at the interfaces of CoSi2 and Si (100) on Schottky barrier contacts

Article information

Article type
Communication
Submitted
03 Apr 2015
Accepted
30 Apr 2015
First published
30 Apr 2015

CrystEngComm, 2015,17, 4276-4280

Effects of atomic scale imperfection at the interfaces of CoSi2 and Si (100) on Schottky barrier contacts

C. Chiou, S. Chiu, J. Lin and Y. Chou, CrystEngComm, 2015, 17, 4276 DOI: 10.1039/C5CE00655D

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