Issue 89, 2017
From the journal:

Chemical Communications

Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture†

Jaeyeon Bae, ORCID logo a   Jin-Woo Jung,a   Hyo Yul Park,b   Chang-Hee Choa  and  Jinhee Park ORCID logo *a  

* Corresponding authors

a Department of Emerging Materials Science, Daegu Gyeongbuk Institute of Science and Technology, Daegu, Republic of Korea
E-mail: jinhee@dgist.ac.kr

b Creative and Fundamental Research Division, Korea Electrotechnology Research Institute, Seongsan-gu, Changwon 51543, South Korea

Abstract

Despite their remarkable properties, metal–organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture.

Graphical abstract: Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

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Article information

DOI
https://doi.org/10.1039/C7CC05845D
Article type
Communication
Submitted
27 Jul 2017
Accepted
11 Oct 2017
First published
11 Oct 2017

Chem. Commun., 2017,53, 12100-12103

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Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

J. Bae, J. Jung, H. Y. Park, C. Cho and J. Park, Chem. Commun., 2017, 53, 12100 DOI: 10.1039/C7CC05845D

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