Issue 33, 2016

Creation of hollow SAPO-34 single crystals via alkaline or acid etching

Abstract

Hollow SAPO-34 crystals are created via selective etching of their precursor under controlled alkaline or acid conditions. The abundant/interconnected Si–O–Al domains and Si–O–Si networks at the outer layer of SAPO-34 crystals are revealed to be decisive factors for the base and acid treatments respectively to achieve a well-preserved hollow structure.

Graphical abstract: Creation of hollow SAPO-34 single crystals via alkaline or acid etching

Supplementary files

Article information

Article type
Communication
Submitted
07 Dec 2015
Accepted
23 Mar 2016
First published
23 Mar 2016

Chem. Commun., 2016,52, 5718-5721

Author version available

Creation of hollow SAPO-34 single crystals via alkaline or acid etching

Y. Qiao, M. Yang, B. Gao, L. Wang, P. Tian, S. Xu and Z. Liu, Chem. Commun., 2016, 52, 5718 DOI: 10.1039/C5CC10070D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements