Issue 78, 2012
From the journal:

Chemical Communications

Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films†

Xin Deng,ab   Jillian M. Buriak,c   Pei-Xia Dai,a   Li-Jun Wana  and  Dong Wang*a  

* Corresponding authors

a Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, the Chinese Academy of Sciences, and Beijing National Laboratory for Molecular Sciences, Beijing 100190, China
E-mail: wangd@iccas.ac.cn
Fax: +86-10-62558934
Tel: +86-10-62558934

b Graduate University of the Chinese Academy of Sciences, China

c National Institute for Nanotechnology, and the Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada

Abstract

Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.

Graphical abstract: Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

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Article information

DOI
https://doi.org/10.1039/C2CC35010F
Article type
Communication
Submitted
13 Jul 2012
Accepted
14 Aug 2012
First published
15 Aug 2012

Chem. Commun., 2012,48, 9741-9743

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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

X. Deng, J. M. Buriak, P. Dai, L. Wan and D. Wang, Chem. Commun., 2012, 48, 9741 DOI: 10.1039/C2CC35010F

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