Issue 33, 2010
From the journal:

Chemical Communications

Vapor–liquid–solid growth of siliconnanowires using organosilane as precursor†

Hong-Jie Yang,a   Fang-Wei Yuana  and  Hsing-Yu Tuan*a  

* Corresponding authors

a Department of Chemical Engineering, National Tsing Hua University, 101, Section 2, Kuang-Fu Road, Hsinchu, Taiwan 30013, ROC
E-mail: hytuan@che.nthu.edu.tw
Fax: +886-3-5715408
Tel: +886-3-5715131 ext. 42509

Abstract

Utilizing monophenylsilane as the precursor and liquid injection chemical vapor deposition (LICVD) as the fabrication method offers a novel synthetic approach for the facile, ambient pressure, and continuous vapor–liquid–solid (VLS) synthesis of high quality Si nanowires.

Graphical abstract: Vapor–liquid–solid growth of silicon nanowires using organosilane as precursor

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Article information

DOI
https://doi.org/10.1039/C0CC01454K
Article type
Communication
Submitted
17 May 2010
Accepted
21 Jun 2010
First published
26 Jul 2010

Chem. Commun., 2010,46, 6105-6107

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Vapor–liquid–solid growth of silicon nanowires using organosilane as precursor

H. Yang, F. Yuan and H. Tuan, Chem. Commun., 2010, 46, 6105 DOI: 10.1039/C0CC01454K

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