Issue 1, 2002
From the journal:

Chemical Communications

Fabrication of a nano-scale gap by selective chemical deposition

Lan Huang,*a   Lina Xu,a   Haiqin Zhanga  and  Ning Gua  

* Corresponding authors

a National Laboratory of Molecular and Biomolecular Electronics, Southeast University, Nanjing, People’s Republic of China
E-mail: huanglan822@yahoo.com
Fax: +86 25 3619983
Tel: +86 25 3794960

Abstract

An electrode nanogap of 45 nm has been prepared by a new method in which the initial gap of 1–2 μm obtained by conventional lithography was shortened by selective chemical deposition of copper onto the electrodes.

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Article information

DOI
https://doi.org/10.1039/B109189C
Article type
Communication
Submitted
19 Oct 2001
Accepted
29 Nov 2001
First published
21 Dec 2001

Chem. Commun., 2002, 72-73

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Fabrication of a nano-scale gap by selective chemical deposition

L. Huang, L. Xu, H. Zhang and N. Gu, Chem. Commun., 2002, 72 DOI: 10.1039/B109189C

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