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Issue 22, 2000
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In situ STM observation with atomic resolution on platinum film electrodes formed by a sputtering method

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Abstract

The first high-quality in situ STM atomic images of sputtering-deposited platinum film electrodes potentiostated at 0.15 V (vs. RHE) in 0.1 M HClO4 are reported showing that potential-induced hydrogen adsorption effectively cleaned the Pt surfaces with predominantly (111)-oriented facets.

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Publication details

The article was received on 06 Sep 2000, accepted on 10 Oct 2000 and first published on 03 Nov 2000


Article type: Communication
DOI: 10.1039/B007222M
Chem. Commun., 2000, 2279-2280

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    In situ STM observation with atomic resolution on platinum film electrodes formed by a sputtering method

    S. Yau, T. Moriyama, H. Uchida and M. Watanabe, Chem. Commun., 2000, 2279
    DOI: 10.1039/B007222M

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