Photoinduced novel silylation of CF3-substituted benzenes with disilane and trisilane
Abstract
Irradiation of CF3-substituted benzene in the presence of hexamethyldisilane and octamethyltrisilane causes two types of photosilylation, namely one at a benzylic position to give the corresponding benzylic silanes, and the other at aromatic ring to afford the corresponding phenylsilanes.