Issue 16, 1987
From the journal:

Journal of the Chemical Society, Chemical Communications

Ultra-high vacuum preparation and characterization of ultra-thin layers of SiO2 on ZrO2 and TiO2 by chemical vapour deposition of Si(OEt)4

T. Jin,   T. Okuhara  and  J. M. White  

Abstract

SiO2 overlayers, prepared by chemical vapour deposition of Si(OEt)4, were identified by ion scattering spectroscopy and Auger electron spectroscopy to be ultra-thin films uniformly coating ZrO2, but this was not the case for TiO2.

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Article information

DOI
https://doi.org/10.1039/C39870001248
Article type
Paper

J. Chem. Soc., Chem. Commun., 1987, 1248-1249

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Ultra-high vacuum preparation and characterization of ultra-thin layers of SiO2 on ZrO2 and TiO2 by chemical vapour deposition of Si(OEt)4

T. Jin, T. Okuhara and J. M. White, J. Chem. Soc., Chem. Commun., 1987, 1248 DOI: 10.1039/C39870001248

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