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Issue 16, 2014
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Advantages, drawbacks and applications of mixed Ar–N2 sources in inductively coupled plasma-based techniques: an overview

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Abstract

This review deals with mixed gas Ar–N2 plasmas, highlighting advantages, limitations and applications of them in inductively coupled plasma optical emission spectrometry (ICP OES), inductively coupled plasma mass spectrometry (ICP-MS) and laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) techniques, covering publications in the last three decades. Fundamental plasma parameters (such as electron number density, excitation or ionization temperatures, oxides and spatial profiles of ion distribution), performance of the mixed gas Ar–N2 plasmas, and figures of merit are presented and discussed in order to demonstrate the effects of adding N2 to the Ar-ICP.

Graphical abstract: Advantages, drawbacks and applications of mixed Ar–N2 sources in inductively coupled plasma-based techniques: an overview

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Publication details

The article was received on 20 Jan 2014, accepted on 05 May 2014 and first published on 06 May 2014


Article type: Critical Review
DOI: 10.1039/C4AY00178H
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Anal. Methods, 2014,6, 6170-6182

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    Advantages, drawbacks and applications of mixed Ar–N2 sources in inductively coupled plasma-based techniques: an overview

    G. L. Scheffler and D. Pozebon, Anal. Methods, 2014, 6, 6170
    DOI: 10.1039/C4AY00178H

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