Viable route for switching of an engineered silica surface using Cu2+ ions at sub-ppm levels
Abstract
- This article is part of the themed collection: Highlighting analytical science in France, Italy and Spain
* Corresponding authors
a Dipartimento di Scienze Chimiche, Università di Catania, Viale Andrea Doria 6, Catania, Italy
b
I.N.S.T.M. UdR of Catania, Viale Andrea Doria 6, Catania, Italy
E-mail:
agulino@dipchi.unict.it
F. Lupo, S. Gentile, F. P. Ballistreri, G. A. Tomaselli, M. E. Fragalà and A. Gulino, Analyst, 2010, 135, 2273 DOI: 10.1039/C0AN00364F
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content