Improving diacetylene photopolymerization in monolayers and ultrathin films

Abstract

Gentle annealing and photopolymerization under inert atmospheres strongly enhance the quality of polydiacetylene monolayers. These simple measures not only triple the average degree of polymerization but also alter the preferred photoexcitation mode and cause pronounced nano-alignment during the early stages of polymerization.

Graphical abstract: Improving diacetylene photopolymerization in monolayers and ultrathin films

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Article information

Article type
Paper
Submitted
05 Feb 2025
Accepted
18 Mar 2025
First published
20 Mar 2025

Nanoscale, 2025, Advance Article

Improving diacetylene photopolymerization in monolayers and ultrathin films

J. Ji, Y. Li, S. Bernaerts, K. S. Mali, R. Ding, H. Lin, L. A. Cuccia, S. De Feyter, O. Ivasenko, L. Chi and Y. Fang, Nanoscale, 2025, Advance Article , DOI: 10.1039/D5NR00520E

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