Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition

Davide Barreca; Enrico Scattolin; Chiara Maccato; Alberto Gasparotto; Lorenzo Signorin; Naida El Habra; Andraž Šuligoj; Urška Lavrenčič Štangar; Gian Andrea Rizzi

doi:10.1039/D4CC06548D

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Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition†

Davide Barreca,

^a Enrico Scattolin,

^b Chiara Maccato,

*^ab Alberto Gasparotto,

^ab Lorenzo Signorin,^b Naida El Habra,

^ae Andraž Šuligoj,

^cd Urška Lavrenčič Štangar

^d and Gian Andrea Rizzi

^ab

Author affiliations

* Corresponding authors

^a CNR-ICMATE and INSTM, Department of Chemical Sciences, Padova University Via Marzolo 1, 35131 Padova, Italy

^b Department of Chemical Sciences, Padova University and INSTM, 35131 Padova, Italy
E-mail: chiara.maccato@unipd.it

^c National Institute of Chemistry, Ljubljana SI-1000, Slovenia

^d Faculty of Chemistry and Chemical Technology, University of Ljubljana, Ljubljana SI-1000, Slovenia

^e CNR-ICMATE, 35127 Padova, Italy

Abstract

An original plasma assisted vapor phase route is proposed for the low-temperature fabrication of supported NiO nanostructures on conductive glasses. The sole deposition time variation enables to tailor material properties, modulating, in turn, the system wettability and functional performances in the photodegradation of recalcitrant pollutants.

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Article information

DOI: https://doi.org/10.1039/D4CC06548D
Article type: Communication
Submitted: 13 Dec 2024
Accepted: 13 Jan 2025
First published: 17 Jan 2025
This article is Open Access

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Chem. Commun., 2025,61, 2945-2948

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Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition

D. Barreca, E. Scattolin, C. Maccato, A. Gasparotto, L. Signorin, N. El Habra, A. Šuligoj, U. L. Štangar and G. A. Rizzi, Chem. Commun., 2025, 61, 2945 DOI: 10.1039/D4CC06548D

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Chemical Communications

Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition†

Abstract

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Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition

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