Issue 39, 2024

High-performance multilevel nonvolatile organic field-effect transistor memory based on multilayer organic semiconductor heterostructures

Abstract

Nonvolatile organic field-effect transistor (OFET) memory devices have great potential for next-generation memory due to their advantages of low cost, light weight, mechanical flexibility and easy processing. However, addressing the issue of limited data storage capacity remains a critical challenge. In this study, we propose a multilevel nonvolatile OFET memory device featuring five-layer organic semiconductor heterostructures composed of pentacene and N,N′-ditridecylperylene-3,4,9,10-tetracarb-oxylic diimide (P13). The innovative semiconductor heterostructures exhibit quantum well-like characteristics, and efficiently function as charge trapping sites. These characteristics synergize with the charge trapping properties of the polystyrene (PS) layer, resulting in a significant enhancement of the device's charge storage capacity. The organic semiconductor heterostructure-based memory device demonstrates exceptional nonvolatile memory properties, including a large charge storage capacity (5.48 × 1012 cm−2), a high mobility (2.06 cm2 V−1 s−1), a high ON/OFF current ratio (105), and a long data retention (over 104 s). Moreover, a four-level data storage was achieved owing to the device's high charge capacity properties, significantly augmenting memory capacity. This research presents a promising methodology for the realization of high-performance organic memory for future technology.

Graphical abstract: High-performance multilevel nonvolatile organic field-effect transistor memory based on multilayer organic semiconductor heterostructures

Supplementary files

Article information

Article type
Paper
Submitted
04 Jul 2024
Accepted
25 Aug 2024
First published
28 Aug 2024

J. Mater. Chem. C, 2024,12, 16092-16099

High-performance multilevel nonvolatile organic field-effect transistor memory based on multilayer organic semiconductor heterostructures

Y. Qian, J. Li, W. Li, Z. Song, H. Yu, Z. Feng, W. Shi, W. Huang and M. Yi, J. Mater. Chem. C, 2024, 12, 16092 DOI: 10.1039/D4TC02842B

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