Issue 18, 2024

Low temperature UV cross-linked fluorinated polyurethane for organic thin film transistors

Abstract

Organic thin film transistors (OTFTs) have attracted extensive research interest in recent years because of their light weight, low cost, and large area preparation at low temperatures, especially organic thin film transistors based on high dielectric constant (κ) organic dielectric materials with a flat surface prepared by a low-temperature solution method. Here, a UV cross-linked fluorine-containing polyurethane (PU) dielectric layer quickly curing in only 5 min at room temperature was designed and prepared by adding different contents of hexafluorobutyl acrylate through a thiolene click reaction. The spin-coated films were flat and possessed superior solvent resistance, thermal stability, and dielectric qualities. The C8-BTBT based OTFTs prepared with fluorinated PU (FPU) as the dielectric layer exhibited excellent electrical properties, with the highest mobility of 3.53 cm2 V−1 s−1, a switching ratio of 2.8 × 106, the least subthreshold swing of 0.4 V dec−1, a low threshold voltage of −0.3 V, and almost no hysteresis. The results show that the comprehensive performance of FPU is obviously better than that of pure PU, so polymer fluorination is an effective method to optimize the dielectric constant and device performance. These UV cross-linked FPU dielectric materials can be applied in many applications such as flexible electronic devices in the future.

Graphical abstract: Low temperature UV cross-linked fluorinated polyurethane for organic thin film transistors

Supplementary files

Article information

Article type
Paper
Submitted
20 Jan 2024
Accepted
09 Apr 2024
First published
25 Apr 2024

J. Mater. Chem. C, 2024,12, 6671-6679

Low temperature UV cross-linked fluorinated polyurethane for organic thin film transistors

R. Duan, S. Liu, X. Liu, M. Huang, S. He, H. Liu, W. Liu and C. Zhu, J. Mater. Chem. C, 2024, 12, 6671 DOI: 10.1039/D4TC00295D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements