Issue 24, 2024
From the journal:

RSC Advances

Expression of concern: Cefotaxime incorporated bimetallic silver-selenium nanoparticles: promising antimicrobial synergism, antibiofilm activity, and bacterial membrane leakage reaction mechanism

Abdelrahman A. Elakraa,ab   Salem S. Salem,*a   Gharieb S. El-Sayyad*cd  and  Mohamed S. Attiaa  

* Corresponding authors

a Botany and Microbiology Department, Faculty of Science, Al-Azhar University, Nasr City, Cairo 11884, Egypt
E-mail: salemsalahsalem@azhar.edu.eg

b Chemical Industries Department, Industrial Control Authority, Cairo, Egypt

c Department of Microbiology and Immunology, Faculty of Pharmacy, Galala University, New Galala City, Suez, Egypt
E-mail: Gharieb.Elsayyad@gu.edu.eg, Gharieb.S.Elsayyad@eaea.org.eg

d Drug Microbiology Lab., Drug Radiation Research Department, National Center for Radiation Research and Technology (NCRRT), Egyptian Atomic Energy Authority (EAEA), Cairo, Egypt

Abstract

Expression of concern for ‘Cefotaxime incorporated bimetallic silver-selenium nanoparticles: promising antimicrobial synergism, antibiofilm activity, and bacterial membrane leakage reaction mechanism’ by Abdelrahman A. Elakraa et al., RSC Adv., 2022, 12, 26603–26619, https://doi.org/10.1039/D2RA04717A.

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Article information

DOI
https://doi.org/10.1039/D4RA90060J
Article type
Expression of Concern
Submitted
22 May 2024
Accepted
22 May 2024
First published
28 May 2024
This article is Open Access
Creative Commons BY license

RSC Adv., 2024,14, 17236-17236

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Expression of concern: Cefotaxime incorporated bimetallic silver-selenium nanoparticles: promising antimicrobial synergism, antibiofilm activity, and bacterial membrane leakage reaction mechanism

A. A. Elakraa, S. S. Salem, G. S. El-Sayyad and M. S. Attia, RSC Adv., 2024, 14, 17236 DOI: 10.1039/D4RA90060J

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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