Issue 8, 2024

Water-soluble bis-chalcone-based photoinitiators with long-wavelength absorption for radical polymerization and 3D printing

Abstract

Two water-soluble bis-chalcone-based photoinitiators 4,4′-((((1E,1′E)-(2-oxocyclopentane-1,3-diylidene)bis(methaneylylidene))bis(thiophene-5,2-diyl))bis(9H-carbazole-3,9-diyl))bis(butane-1-sulfonic acid) (KSES) and 4,4′-((((1E,1′E)-(2-oxocyclohexane-1,3-diylidene)bis(methaneylylidene))bis(thiophene-5,2-diyl))bis(9H-carbazole-3,9-diyl))bis(butane-1-sulfonic acid) (KSTS) were successfully synthesized. The maximum absorption wavelengths (λmax) of KSES and KSTS in water were 514 and 469 nm, respectively. KSES and KSTS could be combined with diphenyliodonium hexafluorophosphate (Iod) and triethanolamine (TEOA) to form a three-component photoinitiation system, which could quickly trigger the curing of acrylate coatings under visible light with a final C[double bond, length as m-dash]C bond conversion of more than 98%. The high free radical polymerization efficiency also made the bis-chalcone/Iod/TEOA system suitable for 3D printing, successfully printing clear and photobleached 3D objects. In addition, we carried out photosteady-state degradation, fluorescence quenching and ESR-ST experiments to further study the photopolymerization mechanism. Besides, KSES and KSTS also exhibited good biocompatibility, photobleaching performance and extremely low mobility. Considering the above excellent performance, the two water-soluble bis-chalcone-based photoinitiators reported in this study are very good choices for visible light polymerization in water-soluble systems.

Graphical abstract: Water-soluble bis-chalcone-based photoinitiators with long-wavelength absorption for radical polymerization and 3D printing

Supplementary files

Article information

Article type
Paper
Submitted
07 Jan 2024
Accepted
23 Jan 2024
First published
31 Jan 2024

Polym. Chem., 2024,15, 796-806

Water-soluble bis-chalcone-based photoinitiators with long-wavelength absorption for radical polymerization and 3D printing

W. Lu and J. Qu, Polym. Chem., 2024, 15, 796 DOI: 10.1039/D4PY00023D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements