Issue 13, 2024

Simulation of the resistance switching performance and synaptic behavior of TiO2-based RRAM devices with CoFe2O4 insertion layers

Abstract

The electrothermal coupling model of Pt/CoFe2O4/TiO2/TiN devices was established to study their resistive switching characteristics and basic biological synaptic properties in our research. The processes of set and reset are simulated, and the distribution of the temperature, the electric field and the concentration of oxygen vacancies in the dielectric layer are obtained. The switching performance of the TiO2-based device is significantly improved after the CoFe2O4 layer is inserted, with the switching voltage, working current and power consumption being reduced, while the switching ratio is increased. By changing the thermal conductivity of the top electrode, the rupture position of the conductive filament can be controlled. The IV characteristics of the Pt/CoFe2O4/TiO2/TiN device during the reset and set processes are fitted linearly in logarithmic coordinates, and the ohmic conduction mechanism or the space-limited charge conduction mechanism is mainly satisfied in the high and low resistance states. Finally, the application of dual-layer devices on biological synapses is studied, and the basic biological characteristics of enhancement, inhibition and paired pulse promotion are simulated successfully. In addition, the redox reaction induced by oxygen vacancy migration also promotes the formation and rupture of the conductive filament. Results of the study show this ferrite material as an insertion layer in a resistive random-access memory structure that offers potential for future information storage and bioneuromorphic computation devices.

Graphical abstract: Simulation of the resistance switching performance and synaptic behavior of TiO2-based RRAM devices with CoFe2O4 insertion layers

Article information

Article type
Paper
Submitted
22 Nov 2023
Accepted
01 Mar 2024
First published
02 Mar 2024

Nanoscale, 2024,16, 6729-6738

Simulation of the resistance switching performance and synaptic behavior of TiO2-based RRAM devices with CoFe2O4 insertion layers

F. Yang, B. Hu, Z. He, B. Liu, S. Lou, D. Li and W. Wang, Nanoscale, 2024, 16, 6729 DOI: 10.1039/D3NR05935A

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