Issue 79, 2024
From the journal:

Chemical Communications

Precision synthesis of diblock copolymers via free radical photopolymerization†

Jingfang Li, ORCID logo *a   Qilu Deng,a   Zhihao Xing,b   Jiaxin Yu,b   Wenjie Li,b   Xianju Zhou, ORCID logo a   Xiaoqun Zhu ORCID logo bc  and  Jun Nie ORCID logo bc  

* Corresponding authors

a School of Science, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
E-mail: lijf@cqupt.edu.cn

b State Key Laboratory of Chemical Resource Engineering, Beijing Laboratory of Biomedical Materials, Beijing University of Chemical Technology, Beijing, China

c Jiangsu Jicui Photosensitive Electronic Materials Research Institute limited company, Jiangsu, China

Abstract

Diblock copolymers of phenyl methacrylate (PMA) and butyl methacrylate (BMA) were synthesized using dual-wavelength photopolymerization with a bifunctional photoinitiator 2-(4-(2-hydroxy-2-methylpropanoyl)phenoxy)ethyl(E)-3-(1-methyl-1H-pyrrol-2-yl)acrylate (PAA-2959).

Graphical abstract: Precision synthesis of diblock copolymers via free radical photopolymerization

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Article information

DOI
https://doi.org/10.1039/D4CC03634D
Article type
Communication
Submitted
20 Jul 2024
Accepted
19 Aug 2024
First published
23 Aug 2024

Chem. Commun., 2024,60, 11072-11075

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Precision synthesis of diblock copolymers via free radical photopolymerization

J. Li, Q. Deng, Z. Xing, J. Yu, W. Li, X. Zhou, X. Zhu and J. Nie, Chem. Commun., 2024, 60, 11072 DOI: 10.1039/D4CC03634D

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