Optimizing pulsed laser deposition of crystalline BiVO4 thin films on yttrium-stabilized zirconia (110) substrates

Zhaoyi Xi; Chenyu Zhou; Kim Kisslinger; Mingzhao Liu

doi:10.1039/D4CC03301A

You do not have JavaScript enabled. Please enable JavaScript to access the full features of the site or access our non-JavaScript page.

Optimizing pulsed laser deposition of crystalline BiVO₄ thin films on yttrium-stabilized zirconia (110) substrates†

Zhaoyi Xi,

^ab Chenyu Zhou,

^a Kim Kisslinger^a and Mingzhao Liu

*^a

Author affiliations

* Corresponding authors

^a Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
E-mail: mzliu@bnl.gov

^b Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, USA

Abstract

Different conditions are explored to understand their effects on the pulsed laser deposition of BiVO₄ water splitting photoanodes, over YSZ (110) substrates. A two-step deposition (TSD) method can independently tune nucleation and bulk film growth, leading to the formation of a phase pure, crystalline BiVO₄ film with optimized water splitting activities.

Download options Please wait...

Supplementary files

Supplementary information PDF (1268K)

Article information

DOI: https://doi.org/10.1039/D4CC03301A
Article type: Communication
Submitted: 03 Jul 2024
Accepted: 14 Aug 2024
First published: 14 Aug 2024

Download Citation

Chem. Commun., 2024,60, 9974-9977

Permissions

Request permissions

Optimizing pulsed laser deposition of crystalline BiVO₄ thin films on yttrium-stabilized zirconia (110) substrates

Z. Xi, C. Zhou, K. Kisslinger and M. Liu, Chem. Commun., 2024, 60, 9974 DOI: 10.1039/D4CC03301A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Social activity

Fetching data from CrossRef.
This may take some time to load.

Chemical Communications