Issue 30, 2023

A systematic study of the relationship between the high-frequency dielectric dissipation factor and water adsorption of polyimide films

Abstract

Low dissipation factor (Df) at high-frequencies is crucial for the application of dielectric materials in next generation mobile communication. However, the relationship between the high-frequency Df and the molecular structure remains unclear, and the precision molecular design of high-frequency low Df materials remains extremely challenging. In this study, seven polyimide films containing different hydrophilic or hydrophobic groups were successfully prepared, and their water adsorption and dielectric properties at high-frequency (10 GHz) were comprehensively studied. By improving the test method of water adsorption, the water adsorption data of PI films were accurately obtained. Both water adsorption and dissipation factor have a good linear relationship with relative humidity, and all correlation coefficients are greater than 0.97. Our results show that the difference in Df in the as-prepared seven polyimide films is mainly caused by the difference in water adsorption, and in the case of similar water adsorption, the molecular structure of polyimide has little effect on Df, which has not been explicitly proposed in previous studies. Here, we clearly reveal that water adsorption plays a key role in high-frequency Df for polyimide films and systematically elucidate the relationship between them, providing theoretical support for the preparation of ultra-low Df polyimides.

Graphical abstract: A systematic study of the relationship between the high-frequency dielectric dissipation factor and water adsorption of polyimide films

Supplementary files

Article information

Article type
Paper
Submitted
16 Apr 2023
Accepted
04 Jun 2023
First published
06 Jun 2023

J. Mater. Chem. C, 2023,11, 10274-10281

A systematic study of the relationship between the high-frequency dielectric dissipation factor and water adsorption of polyimide films

R. Bei, K. Chen, Y. He, C. Li, Z. Chi, S. Liu, J. Xu and Y. Zhang, J. Mater. Chem. C, 2023, 11, 10274 DOI: 10.1039/D3TC01337E

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