Issue 19, 2023

Synthesis of ABCBA-type miktoarm H-shaped copolymers with poly(3-hexylthiophene) segments and their application to intrinsically stretchable photonic transistor memory

Abstract

Recently, semiconducting polymers with intrinsic elasticity have garnered attention for their application in wearable devices. Herein, we synthesized a novel ABCBA-type miktoarm H-shaped copolymer (where A, B, and C represent polystyrene (PS), poly(3-hexylthiophene) (P3HT), and poly(n-butyl acrylate) (PnBA), respectively) via a Cu-catalyzed azide–alkyne cycloaddition reaction between in-chain-functionalized PS-b-P3HT with an alkynyl group and α,ω-chain-end-functionalized PnBA with azide groups. The thin films of the ABCBA-type miktoarm H-shaped copolymers exhibited high elasticity because of an inner PnBA segment with a low glass transition temperature and good photonic transistor memory properties because of outer PS-b-P3HT segments. They also exhibited good memory endurance along write–read–erase–read cycles, a wide memory window, a high ON/OFF ratio, and excellent retention properties. Upon stretching, the polymer films exhibited crack-free morphologies wherein large-ranged phase-separated domains were sacrificed to dissipate the applied stress while maintaining short-ranged lamellar crystal structures. Our results establish a pioneering strategy for creating intrinsically stretchable memory using ABCBA-type miktoarm H-shaped copolymers.

Graphical abstract: Synthesis of ABCBA-type miktoarm H-shaped copolymers with poly(3-hexylthiophene) segments and their application to intrinsically stretchable photonic transistor memory

Supplementary files

Article information

Article type
Paper
Submitted
24 Feb 2023
Accepted
24 Apr 2023
First published
25 Apr 2023

J. Mater. Chem. C, 2023,11, 6306-6316

Synthesis of ABCBA-type miktoarm H-shaped copolymers with poly(3-hexylthiophene) segments and their application to intrinsically stretchable photonic transistor memory

S. Inagaki, C. Sung, A. Chang, Y. Lin, W. Chen and T. Higashihara, J. Mater. Chem. C, 2023, 11, 6306 DOI: 10.1039/D3TC00690E

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