Issue 10, 2023

Solvent-assisted sulfur vacancy engineering method in MoS2 for a neuromorphic synaptic memristor

Abstract

Recently, two-dimensional transition metal dichalcogenides (TMDs) such as molybdenum disulfide (MoS2) have attracted great attention due to their unique properties. To modulate the electronic properties and structure of TMDs, it is crucial to precisely control chalcogenide vacancies and several methods have already been suggested. However, they have several limitations such as plasma damage by ion bombardment. Herein, we introduced a novel solvent-assisted vacancy engineering (SAVE) method to modulate sulfur vacancies in MoS2. Considering polarity and the Hansen solubility parameter (HSP), three solvents were selected. Sulfur vacancies can be modulated by immersing MoS2 in each solvent, supported by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy analyses. The SAVE method can further expand its application in memory devices representing memristive performance and synaptic behaviors. We represented the charge transport mechanism of sulfur vacancy migration in MoS2. The non-destructive, scalable, and novel SAVE method controlling sulfur vacancies is expected to be a guideline for constructing a vacancy engineering system of TMDs.

Graphical abstract: Solvent-assisted sulfur vacancy engineering method in MoS2 for a neuromorphic synaptic memristor

Supplementary files

Article information

Article type
Communication
Submitted
29 May 2023
Accepted
28 Jul 2023
First published
02 Aug 2023

Nanoscale Horiz., 2023,8, 1417-1427

Solvent-assisted sulfur vacancy engineering method in MoS2 for a neuromorphic synaptic memristor

J. Kim, C. Im, C. Lee, J. Hwang, H. Jang, J. H. Lee, M. Jin, H. Lee, J. Kim, J. Sung, Y. S. Kim and E. Lee, Nanoscale Horiz., 2023, 8, 1417 DOI: 10.1039/D3NH00201B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements