Issue 4, 2023

Directly measuring flexoelectric coefficients μ11 of the van der Waals materials

Abstract

Flexoelectricity originates from the electromechanical coupling interaction between strain gradient and polarization, broadly applied in developing electromechanical and energy devices. However, the study of quantifying the longitudinal flexoelectric coefficient (μ11) which is important for the application of atomic-scale two-dimensional (2D) materials is still in a slow-moving stage, owing to the technical challenges. Based on the free-standing suspension structure, this paper proposes a widely applicable method and a mensurable formula for determining the μ11 constant of layer-dependent 2D materials with high precision. A combination of in situ micro-Raman spectroscopy and piezoresponse force microscopy (PFM) imaging was used to quantify the strain distribution and effective out-of-plane electromechanical coupling, respectively, for μ11 constant calculation. The μ11 constants and their physical correlation with the variable mechanical conditions of naturally bent structures have been obtained extensively for the representative mono-to-few layered MX2 family (M = W and Mo; X = S and Se), and the result is perfectly consistent with the estimated order-of-magnitude of the μ11 value (about 0.065) of monolayer MoS2. The quantification of the flexoelectric constant in this work not only promotes the understanding of mechanical and electromechanical properties in van der Waals materials, but also paves the way for developing novel 2D nano-energy devices and mechanical transducers based on flexoelectric effects.

Graphical abstract: Directly measuring flexoelectric coefficients μ11 of the van der Waals materials

Supplementary files

Article information

Article type
Communication
Submitted
09 Aug 2022
Accepted
09 Jan 2023
First published
12 Jan 2023

Mater. Horiz., 2023,10, 1309-1323

Directly measuring flexoelectric coefficients μ11 of the van der Waals materials

M. Deng, X. Wang, X. Xu, A. Cui, K. Jiang, J. Zhang, L. Zhu, L. Shang, Y. Li, Z. Hu and J. Chu, Mater. Horiz., 2023, 10, 1309 DOI: 10.1039/D2MH00984F

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