Issue 93, 2023

Chemical synthesis of complex oxide thin films and freestanding membranes

Abstract

Oxides offer unique physical and chemical properties that inspire rapid advances in materials chemistry to design and nanoengineer materials compositions and implement them in devices for a myriad of applications. Chemical deposition methods are gaining attention as a versatile approach to develop complex oxide thin films and nanostructures by properly selecting compatible chemical precursors and designing an accurate cost-effective thermal treatment. Here, upon describing the basics of chemical solution deposition (CSD) and atomic layer deposition (ALD), some examples of the growth of chemically-deposited functional complex oxide films that can have applications in energy and electronics are discussed. To go one step further, the suitability of these techniques is presented to prepare freestanding complex oxides which can notably broaden their applications. Finally, perspectives on the use of chemical methods to prepare future materials are given.

Graphical abstract: Chemical synthesis of complex oxide thin films and freestanding membranes

Article information

Article type
Feature Article
Submitted
23 Jun 2023
Accepted
16 Oct 2023
First published
03 Nov 2023
This article is Open Access
Creative Commons BY-NC license

Chem. Commun., 2023,59, 13820-13830

Chemical synthesis of complex oxide thin films and freestanding membranes

P. Salles, P. Machado, P. Yu and M. Coll, Chem. Commun., 2023, 59, 13820 DOI: 10.1039/D3CC03030J

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