Germanium photopatterning via poly(cyclogermapentene)s

Abstract

A series of air-stable poly(cyclogermapentene)s were prepared via the dehydrocoupling of 1,1-dihydrocyclogermapentene monomers. Exposure of the resulting polygermanes to UV light led to elimination of organobutadiene from the polymer side chains and deposition of germanium metal. Overall, this study introduces a mild way to obtain patterns of semiconducting Ge for optoelectronic applications.