Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

Maxime Gayrard; Benedetta Marmiroli; Francois Chancerel; Philippe Decorse; Heinz Amenitsch; Jennifer Peron; Andrea Cattoni; Marco Faustini

doi:10.1039/D1NR07455E

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Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films†

Maxime Gayrard,^a Benedetta Marmiroli,

^b Francois Chancerel,^acd Philippe Decorse,^e Heinz Amenitsch,^b Jennifer Peron,

^e Andrea Cattoni

^cd and Marco Faustini

*^a

Author affiliations

* Corresponding authors

^a Sorbonne Université, CNRS, Laboratoire Chimie de la Matière Condensée de Paris (LCMCP), F-75005 Paris, France
E-mail: marco.faustini@sorbonne-universite.fr

^b Institute of Inorganic Chemistry, Graz University of Technology, Graz, Austria

^c Institut Photovoltaïque d'Ile-de-France (IPVF), CNRS UMR 9006, Palaiseau, France

^d Centre de Nanosciences et de Nanotechnologies (C2N), CNRS UMR 9001, Université Paris-Saclay, Palaiseau, France

^e Université de Paris, ITODYS, CNRS, UMR 7086, 15 rue J-A de Baïf, F-75013 Paris, France

Abstract

Noble metal coordination xerogel films (mesostructured with block-copolymers) exhibit solubility switching with increasing X-ray irradiation. Different from other sol–gel systems, these are attributed to film deconstruction under irradiation. These materials can be used as recyclable negative tone resists for deep X-ray lithography that can be further converted into metallic nanoarchitectured films.

This article is part of the themed collection: Nanoscale 2022 Emerging Investigators

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DOI: https://doi.org/10.1039/D1NR07455E
Article type: Communication
Submitted: 10 Nov 2021
Accepted: 19 Dec 2021
First published: 21 Dec 2021

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Nanoscale, 2022,14, 1706-1712

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Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

M. Gayrard, B. Marmiroli, F. Chancerel, P. Decorse, H. Amenitsch, J. Peron, A. Cattoni and M. Faustini, Nanoscale, 2022, 14, 1706 DOI: 10.1039/D1NR07455E

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Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films†

Abstract

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