Issue 17, 2021

Growth of robust metal–organic framework films by spontaneous oxidation of a metal substrate for NO2 sensing

Abstract

As with most functional materials, integrating metal–organic frameworks (MOFs) in a miniaturised fashion can easily achieve portable multifunctional platforms. However, the construction of MOF films with remarkable robustness and adhesion between the MOF crystals and the substrate still remains challenging. Herein, a facile strategy involving the spontaneous oxidation of a metal substrate was proposed for the development of robust MOF films. By utilizing the metal substrate as the only metal source, five different MOF films can be synthesized in different ligand solutions. The high quality of the as-obtained MOF films is proved by adhesion examinations through scanning electron microscopy measurements. It should be noted that even in strong corrosive environments the as-prepared products can be well preserved, ensuring their applications in extreme environments. Among them, ZJU-66 with a newly reported structure was selected as a representative to demonstrate its outstanding NO2 sensing performance by hindering the excitation and emission processes due to the strong electron absorption capacity of NO2. We believe that this general strategy illustrated in this work can open up a new avenue for the development of other high-quality and highly stable MOF films with potential applications for various fields.

Graphical abstract: Growth of robust metal–organic framework films by spontaneous oxidation of a metal substrate for NO2 sensing

Supplementary files

Article information

Article type
Research Article
Submitted
25 Apr 2021
Accepted
24 Jun 2021
First published
02 Jul 2021

Mater. Chem. Front., 2021,5, 6476-6484

Growth of robust metal–organic framework films by spontaneous oxidation of a metal substrate for NO2 sensing

J. Zhang, E. Hu, F. Liu, H. Li and T. Xia, Mater. Chem. Front., 2021, 5, 6476 DOI: 10.1039/D1QM00626F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements