Study on the catalyst effect of NaCl on MoS2 growth in a chemical vapor deposition process

Abstract

Due to its unique two-dimensional (2D) structural characteristics, monolayer MoS₂ is considered to be an ideal material for next-generation optoelectronic devices. At present, chemical vapor deposition (CVD) growth is the suitable technology for preparing MoS₂. In order to improve the growth quality of MoS₂, NaCl is often used as a catalyst in the synthesis. However, the catalyst has negative effects on the grown MoS₂ morphology even though it can facilitate the growth. Here, we study the partial multilayer growth in the MoS₂ synthesis caused by the NaCl catalyst, and then propose a mechanism for understanding the growth phenomena. The study provides theoretical guidance and reference for synthesizing high-quality monolayer MoS₂.