Issue 9, 2020

Integration of highly anisotropic multiferroic BaTiO3–Fe nanocomposite thin films on Si towards device applications

Abstract

Integration of highly anisotropic multiferroic thin films on silicon substrates is a critical step towards low-cost devices, especially high-speed and low-power consumption memories. In this work, an oxide–metal vertically aligned nanocomposite (VAN) platform has been used to successfully demonstrate self-assembled multiferroic BaTiO3–Fe (BTO–Fe) nanocomposite films with high structural anisotropy on Si substrates. The effects of various buffer layers on the crystallinity, microstructure, and physical properties of the BTO–Fe films have been explored. With an appropriate buffer layer design, e.g. SrTiO3/TiN bilayer buffer, the epitaxial quality of the BTO matrix and the anisotropy of the Fe nanopillars can be improved greatly, which in turn enhances the physical properties, including the ferromagnetic, ferroelectric, and optical response of the BTO–Fe thin films. This unique combination of properties integrated on Si offers a promising approach in the design of multifunctional nanocomposites for Si-based memories and optical devices.

Graphical abstract: Integration of highly anisotropic multiferroic BaTiO3–Fe nanocomposite thin films on Si towards device applications

Supplementary files

Article information

Article type
Paper
Submitted
16 Mar 2020
Accepted
18 Jul 2020
First published
21 Jul 2020
This article is Open Access
Creative Commons BY license

Nanoscale Adv., 2020,2, 4172-4178

Integration of highly anisotropic multiferroic BaTiO3–Fe nanocomposite thin films on Si towards device applications

M. Kalaswad, B. Zhang, X. Wang, H. Wang, X. Gao and H. Wang, Nanoscale Adv., 2020, 2, 4172 DOI: 10.1039/D0NA00405G

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