Issue 12, 2019

Controlled deposition of large-area and highly-ordered thin films: effect of dip-coating-induced morphological evolution on resistive memory performance

Abstract

Developing a simple, versatile and efficient technique that enables both large-scale production and nano-scale control is highly desirable but very challenging for achieving high-performance organic-based memory electronic devices. Herein, we employed a dip-coating method to fabricate reliable and cost-effective organic memory devices (OMDs). This technique enables us to deposit high-quality, homogeneous and large-area nanopatterns on the surfaces of thin films and realize uniform OMD performances with a record reproducibility up to 96%. To the best of our knowledge, this is the first report on dip-coated OMDs with the highest reproducibility observed to date, which demonstrates the promising versatility of the dip-coating technique to fabricate organic memory devices and its suitability to scale-up for high-throughput solution processing.

Graphical abstract: Controlled deposition of large-area and highly-ordered thin films: effect of dip-coating-induced morphological evolution on resistive memory performance

Supplementary files

Article information

Article type
Paper
Submitted
23 Jan 2019
Accepted
20 Feb 2019
First published
20 Feb 2019

J. Mater. Chem. C, 2019,7, 3512-3521

Controlled deposition of large-area and highly-ordered thin films: effect of dip-coating-induced morphological evolution on resistive memory performance

Y. Li, C. Zhang, Z. Li, P. Gu, Z. Wang, H. Li, J. Lu and Q. Zhang, J. Mater. Chem. C, 2019, 7, 3512 DOI: 10.1039/C9TC00431A

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