Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiOx with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography.
Z. Hemmatian, D. Gentili, M. Barbalinardo, V. Morandi, L. Ortolani, G. Ruani and M. Cavallini, Nanoscale Adv., 2019, 1, 3887 DOI: 10.1039/C9NA00445A
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