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TRANSPARENT RUTILE TiO2 FILMS PREPARED BY THERMAL OXIDATION OF SPUTTERED Ti ON FTO GLASS

Abstract

TiO2 films were prepared via a two-step fabrication, i.e. deposition of Ti films by magnetron sputtering on FTO glass substrate followed by thermal oxidation at 600-725 °C. Investigated parameters were Ti layer thickness, temperature of oxidation and deposition conditions (pre-treatment, substrate heating). Such TiO2 films have a rutile structure and contain metallic Sn which is the result of thermal reaction at the interface between SnO2 and Ti at temperatures above 500○C. A calcination temperature 600 ○C is optimal for fabricating TiO2 films of significant photoelectrochemical response. Heating of the FTO substrate during magnetron sputtering deposition of Ti films results in a significant improvement of the compactness of TiO2 films. A similar but not so pronounced improvement was observed for TiO2 films deposited on the FTO substrate pre-treated by radio-frequency plasma in Ar-O2 and N2-H2 atmosphere. The observed correlation between increased content of Sn in TiO2 film and compactness of TiO2 film supports the explanation of both positive effects by better adhesion of Ti films to the FTO substrate.

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Publication details

The article was received on 15 Jul 2018, accepted on 02 Nov 2018 and first published on 02 Nov 2018


Article type: Paper
DOI: 10.1039/C8PP00313K
Citation: Photochem. Photobiol. Sci., 2018, Accepted Manuscript
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    TRANSPARENT RUTILE TiO2 FILMS PREPARED BY THERMAL OXIDATION OF SPUTTERED Ti ON FTO GLASS

    J. Krysa, H. Krysova, Z. Hubicka, S. Kment, J. Maixner and L. Kavan, Photochem. Photobiol. Sci., 2018, Accepted Manuscript , DOI: 10.1039/C8PP00313K

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