A simple anti-solvent method for the controlled deposition of metal and alloy nanoparticles

Abstract

Plasmonics of metal and alloy nanoparticles finds immense applications in materials science, medicine and advanced physics. Controlled deposition of these nanoparticles onto simple substrates to yield high Plasmon intensity for different applications such as single molecule sensing is still a challenge. Herein, we present a very simple and general strategy for their controlled deposition, plausibly mediated by the anti-solvent effect or preferential solvation.