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Issue 42, 2018
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A simple chemical solution synthesis of nanowire-assembled hierarchical CuO microspheres with enhanced photochemical properties

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Abstract

Hierarchical micro/nanostructures manifest attractive prospects for photocatalytic application. Nevertheless, large-scale hierarchical micro/nanostructures for industrial application with facile, low-cost and eco-friendly routes remain difficult. Herein, nanowire-assembled hierarchical CuO microspheres (HCMAW) are synthesized for the first time by CO32− ions induced synthesis route. The time-dependent SEM images reveal that the growth mechanism for HCMAW is the well-known Ostwald ripening with self-assembly. The specific surface area of the HCMAW is 7.265 m2 g−1, which is higher than that of hierarchical CuO microspheres assembled with nanosheets (HCMAS) (4.952 m2 g−1) prepared by direct self-assembly scheme without the introduction of CO32− ions. Meanwhile, the HCMAW possess strong light absorption around a broadband wavelength from 300 nm to 800 nm. As a result, the photodegradation activity test demonstrates that the HCMAW shows the degradation efficiency of 98.8% for rhodamine B (RhB) under white light irradiation for 30 min in the presence of H2O2 higher than those of HCMAS (66.3%) and commercial CuO (48.3%) under the same condition, which is one of the highest reported till date related to CuO nanomaterials for the degradation of RhB. The novel HCMAW synthesized by the ion-induced protocol is worth being generalized to more assembled hierarchical micro/nanostructures for versatile applications.

Graphical abstract: A simple chemical solution synthesis of nanowire-assembled hierarchical CuO microspheres with enhanced photochemical properties

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Publication details

The article was received on 19 Jul 2018, accepted on 24 Sep 2018 and first published on 27 Sep 2018


Article type: Paper
DOI: 10.1039/C8DT02931H
Citation: Dalton Trans., 2018,47, 15009-15016

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    A simple chemical solution synthesis of nanowire-assembled hierarchical CuO microspheres with enhanced photochemical properties

    L. Li, Y. Zhang, J. Li, D. Ma, D. Li, G. Zhu, H. Tang and X. Li, Dalton Trans., 2018, 47, 15009
    DOI: 10.1039/C8DT02931H

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