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Issue 74, 2017, Issue in Progress
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Improving oxidation efficiency through plasma coupled thin film processing

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Abstract

A continuous flow vortex fluidic device (VFD) with a non-thermal plasma generated above a dynamic thin liquid film created in a rapidly rotating tube is effective in the oxidation of methylene blue. The VFD allows for the control of the film thickness by adjusting the rotational speed, and through this capability we demonstrate that reducing the film thickness enhances the ability for active oxidizing species produced in the plasma to process material contained within the film. These efficiencies inherent in the VFD technology have general applicability to flux-driven chemical processing, such as photo- and electro-chemical transformations.

Graphical abstract: Improving oxidation efficiency through plasma coupled thin film processing

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Publication details

The article was received on 29 Aug 2017, accepted on 01 Oct 2017 and first published on 06 Oct 2017


Article type: Paper
DOI: 10.1039/C7RA09559G
RSC Adv., 2017,7, 47111-47115
  • Open access: Creative Commons BY-NC license
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    Improving oxidation efficiency through plasma coupled thin film processing

    D. B. Jones and Colin L. Raston, RSC Adv., 2017, 7, 47111
    DOI: 10.1039/C7RA09559G

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