Issue 46, 2017

In-plane growth of large ultra-thin SnS2 nanosheets by tellurium-assisted chemical vapor deposition

Abstract

Two-dimensional (2D) SnS2 has attracted significant attention as a potential candidate for modern electronics and optoelectronics. However, the in-plane growth of large ultra-thin SnS2 nanosheets (NSs) still remains a great challenge. In this study, we successfully synthesized in-plane SnS2 NSs with sizes up to 280 μm on SiO2/Si substrates via Te-assisted CVD. On mixing SnO2 and Te, SnO2 reacted with Te to form a Sn–Te eutectic mixture with low melting point, which enhanced the volatilization of the SnO2 precursor. On increasing the substrate temperature from 500 °C to 600 °C, the shape of the SnS2 NSs varied from truncated triangle or hexagonal (HEX) to semi-HEX. High temperature enhanced the migration of the SnS2 adatoms on the substrates and over the edge of the SnS2 NSs; thus, the size of the SnS2 NSs increased with temperature. Further discussion indicates that the truncated triangular shape mainly formed for the substrate breaks the intrinsic sixfold symmetry into three-fold symmetry. The systematic investigation will significantly increase our understanding of the synthesis of 2D materials via Te-assisted CVD.

Graphical abstract: In-plane growth of large ultra-thin SnS2 nanosheets by tellurium-assisted chemical vapor deposition

Supplementary files

Article information

Article type
Paper
Submitted
02 Mar 2017
Accepted
16 May 2017
First published
02 Jun 2017
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2017,7, 29080-29087

In-plane growth of large ultra-thin SnS2 nanosheets by tellurium-assisted chemical vapor deposition

Z. Wang and F. Pang, RSC Adv., 2017, 7, 29080 DOI: 10.1039/C7RA02599H

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