PRAP-CVD: how to design high conformal PEDOT surfaces

Abstract

Efficient deposition of polymers on 3D substrates is a key point for many applications where a high surface area is required. Smart textiles based on conductive fibers is one of the most attractive domains where conformal polymer deposition is essential. In this frame, plasma radical assisted polymerization via chemical vapour deposition (PRAP-CVD), a solvent-free technique, has been demonstrated to be able to deposit highly uniform poly(3,4-ethylenedioxythiophene) (PEDOT) films. Low temperature of the substrate (<100 °C) and medium vacuum (<50 Pa) combined with good functionality of the films allow the application of PRAP-CVD to a wide range of complex substrates. Polyethylene terephthalate wipers were covered with PEDOT by PRAP-CVD to develop textile-based devices. PRAP-CVD versatility goes beyond the current vapour/solution-based techniques as shown in this work.