Issue 43, 2017

Chloride-accelerated Cu-Fenton chemistry for biofilm removal

Abstract

Biofilms present challenges to numerous industries. Herein, a simple approach was developed based on chloride-accelerated Fenton chemistry, where copper oxide nanoparticles facilitate efficient generation of reactive chlorine species for biofilm removal.

Graphical abstract: Chloride-accelerated Cu-Fenton chemistry for biofilm removal

Supplementary files

Article information

Article type
Communication
Submitted
07 Feb 2017
Accepted
08 May 2017
First published
08 May 2017

Chem. Commun., 2017,53, 5862-5865

Chloride-accelerated Cu-Fenton chemistry for biofilm removal

L. Wang, Y. Miao, M. Lu, Z. Shan, S. Lu, J. Hou, Q. Yang, X. Liang, T. Zhou, D. Curry, K. Oakes and X. Zhang, Chem. Commun., 2017, 53, 5862 DOI: 10.1039/C7CC00928C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements