Issue 31, 2016

Green synthesis of Cu micro/nanoparticles for low-resistivity Cu thin films using ascorbic acid in aqueous solution

Abstract

Nanometer- and micrometer-sized Cu particles were synthesized with 100% yield by chemically reducing aqueous Cu–citric acid complexes using ascorbic acid as a reducing agent instead of the commonly employed toxic reducing agents. Surface analysis revealed that the surfaces of the Cu nanoparticles were modified by citric acid, and Na ions remained on the surfaces as impurities. Since the impurities, rather than surface oxide layers, prevented the sintering of the Cu nanoparticles, the resistivity of the thin films prepared using the Cu nanoparticles was decreased by reducing the number of impurities. In addition, the well-packed particulate structure obtained by mixing Cu nanoparticles and Cu microparticles facilitated sintering. We demonstrated that the resistivity of the Cu films prepared using Cu nanoparticles by heat treatment at 300 °C under Ar gas flow was improved from 470 to 8.2 μΩ cm by reducing the number of Na ions on the surfaces and mixing the Cu NPs with Cu microparticles.

Graphical abstract: Green synthesis of Cu micro/nanoparticles for low-resistivity Cu thin films using ascorbic acid in aqueous solution

Supplementary files

Article information

Article type
Paper
Submitted
02 Jun 2016
Accepted
17 Jul 2016
First published
19 Jul 2016

J. Mater. Chem. C, 2016,4, 7494-7500

Green synthesis of Cu micro/nanoparticles for low-resistivity Cu thin films using ascorbic acid in aqueous solution

S. Yokoyama, K. Motomiya, H. Takahashi and K. Tohji, J. Mater. Chem. C, 2016, 4, 7494 DOI: 10.1039/C6TC02280D

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