Issue 107, 2016, Issue in Progress

The electrochemical 4-chlorophenol sensing properties of a plasma-treated multilayer graphene modified photolithography patterned platinum electrode

Abstract

The present work describes the electrochemical 4-chlorophenol (4-CP) sensing properties of multilayer graphene samples (MLG). In order to enhance the presence of oxygen functional groups and to increase the edge plane defects, oxygen plasma treatment is adopted. Raman, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and atomic force microscopy (AFM) characterizations are used to investigate the effect of plasma treatment on MLG. Compared to pristine MLG, the oxygen plasma treated one shows increased oxidation current towards 4-CP. The sensor data exhibit high sensitivity and stability with high anti-interference property in the presence of other phenolic compounds including phenol, bisphenol, 2,3-chlorophenol, 2,3,4-nitrophenol and inorganic ions.

Graphical abstract: The electrochemical 4-chlorophenol sensing properties of a plasma-treated multilayer graphene modified photolithography patterned platinum electrode

Supplementary files

Article information

Article type
Paper
Submitted
28 Sep 2016
Accepted
21 Oct 2016
First published
31 Oct 2016

RSC Adv., 2016,6, 105920-105929

The electrochemical 4-chlorophenol sensing properties of a plasma-treated multilayer graphene modified photolithography patterned platinum electrode

P. K. Kannan, R. V. Gelamo, H. Morgan, P. Suresh and C. S. Rout, RSC Adv., 2016, 6, 105920 DOI: 10.1039/C6RA24136K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements